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X-Ray Photoelectron Spectroscopy (XPS/ESCA)


Responsable/s Científico/s
Dr. Juan Pedro Espinós Manzorro, Dr. Juan Pedro Holgado Vázquez

Técnico/s



Typically, “photoelectron spectroscopies” are a powerful set of non-destructive analysis techniques, exclusively sensitive to the more superficial few atomic layers (20-30 Å), allowing to obtain valuable information about their chemical, physical and electronic properties.

The technical interest of the resulting information is huge in fields such as catalysis, corrosion, surface treatments,, floating and adhesion phenomena, or segregation processes, among others. The most remarkable characteristic of X-Ray Photoelectron Spectroscopy (XPS/ESCA) is that it allows to discriminate, for a given element, between different oxidation states or chemical surroundings (coordination).
 

Available Equipment
Photoelectron Spectrometer VG ESCALAB 210, consisting on:

  • Analysis Chamber, equipped with a hemispheric multichannel analyser VG ESCALAB 210, a four axis manipulator, a dual X-ray source (achromatic Al Kα, Mg Kα), a UV lamp, and a electron gun, allowing to perform surface analysis by XPS, UPS and REELS, including angular resolved studies.
  • Two prechambers for different treatments, with ultimate vacuum levels of 10-8 and 10-9 mbar respectively, where samples can be subjected to diverse treatments and transferred to the analysis chamber without exposure to the atmosphere. The possible treatments include heating at high temperature (< 800C) under controlled atmosphere, ion sputtering with inert or reactive gases, exposure to plasma, laser treatments, deposition of metals, oxides or simple compounds, exfoliation, etc.

Photoelectron Spectrometer SPECS, consisting on:

  • Analysis Chamber, equipped with a hemispheric multichannel analyser PHOIBOS 100, three axis manipulator and dual X-ray source (achromatic Al Kα, Mg Kα).
  • Pre-chamber for High Pressure/High Temperature treatments (HPHT Cell).Samples can be subjected to treatments in the presence of gases up to 20 bar and 800ºC (simultaneously). These treatments can be performed either under static or flowing gas conditions. After treatments, samples can be transferred to the analysis chamber without exposure to the atmosphere.
  • A Fast entry chamber, equipped with a parking and degassing system, allowing the samples to be evacuated at moderate temperature (T < 150ºC). It is also possible to sputter the samples under an accelerated ion beam (0.5- 5.0 kV) using inert or reactive gases. Incorporation of some other equipment (Visible light illumination, metal evaporators) is also contemplated.

Contacto
jpespinos@icmse.csic.es, holgado@icmse.csic.es
954 48 95 31 - 954 48 95 36




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